UHV system for photoemission and surface analysis - SPECS
UHV
SPECS ultra-high vacuum system for sample characterization by methods of
- X-ray and ultraviolet photoelectron spectroscopy (XPS/UPS)
- angle resolved photoelectron spectroscopy (ARPES) with 3D spin detector
- low energy electron diffraction (LEED)
- low energy ion scattering spectroscopy (LEIS)
- scanning tunneling microscopy (STM) and non-contact atomic force microscopy (AFM)
The system consists of four interconnected vacuum chambers (SPECS) pumped by turbomolecular and ion getter pumps (pressure of residual gases ~ 10-10 mbar).
Features:
- X-ray source with micro-focus (200 um) and UV source based on duoplasmatron.
- Monochromators for X-ray and UV radiation
- Hemispherical 180° electron energy analyzer PHOIBOS 150 (SPECS) with scanning angle lens, angular resolution better than 0.1°, energy resolution better than 2 meV.
- Two-dimensional CCD detector, deflector 90°, spin rotator and FERRUM spin detector of VLEED type (FOCUS)
- Motorized 5-axes sample manipulator, sample holder cooling by liquid He down to 20 K.
- Low energy (10-200 keV) and high energy (0.2-5 keV) ion source with differential pumping.
- Reverse view LEED optics
- Aarhus STM, electron beam evaporator and microwave plasma source.
Contact Person
Martin Kalbáč
Location
2nd floor, room 207