UHV system for photoemission and surface analysis - SPECS

UHV

SPECS ultra-high vacuum system for sample characterization by methods of

  • X-ray and ultraviolet photoelectron spectroscopy (XPS/UPS)
  • angle resolved photoelectron spectroscopy (ARPES) with 3D spin detector
  • low energy electron diffraction (LEED)
  • low energy ion scattering spectroscopy (LEIS)
  • scanning tunneling microscopy (STM) and non-contact atomic force microscopy (AFM)

The system consists of four interconnected vacuum chambers (SPECS) pumped by turbomolecular and ion getter pumps (pressure of residual gases ~ 10-10 mbar). 

Features:

  • X-ray source with micro-focus (200 um) and UV source based on duoplasmatron. 
  • Monochromators for X-ray and UV radiation
  • Hemispherical 180° electron energy analyzer PHOIBOS 150 (SPECS) with scanning angle lens, angular resolution better than 0.1°, energy resolution better than 2 meV. 
  • Two-dimensional CCD detector, deflector 90°, spin rotator and FERRUM spin detector of VLEED type (FOCUS) 
  • Motorized 5-axes sample manipulator, sample holder cooling by liquid He down to 20 K.
  • Low energy (10-200 keV) and high energy (0.2-5 keV) ion source with differential pumping. 
  • Reverse view LEED optics 
  • Aarhus STM, electron beam evaporator and microwave plasma source.
  
Contact Person
Martin Kalbáč
Location
2nd floor, room 207