UHV system for surface analysis of thin films, interfaces and nanostructures

Special methods
UHV system for surface analysis of thin films, interfaces and nanostructures
  • Ultra-high vacuum apparatus for characterization of samples by methods of
  • X-ray photoelectron spectroscopy (XPS)
  • angle resolved photoelectron spectroscopy (ARPES) with 3D spin detector
  • ultraviolet photoelectron spectroscopy (UPS)
  • low energy electron diffraction (LEED)
  • scanning probe microscopy (SPM)
  • low energy ion scattering spectroscopy (LEIS)

System of four interconnected vacuum chambers (SPECS) pumped by turbomolecular and ion pumps, pressure of residual gases 10-10 mbar. Motorized 5-axes sample manipulator, sample holder cooling by liquid He down to 20 K. X-ray source with micro-focus (200 um) and UV source based on duoplasmatron. Monochromators for X-ray and UV radiation, hemispherical 180° electron energy analyzer PHOIBOS 150 (SPECS) with scanning angle lens, angular resolution better than 0.1°, energy resolution better than 2 meV. Two-dimensional CCD detector , deflector 90° , spin rotator and FERRUM spin detector of VLEED type (FOCUS). Low energy (10-200 keV) and high energy (0.2-5 keV) ion source with differential pumping. Reverse view LEED optics, Aarhus STM, electron beam evaporator and microwave plasma source.

  
Contact Person
Kalbáč Martin
Location
2nd floor, room 207